Dr. Bernd Lemaitre, worldclass expert in DFM-DFY, joins MunEDA Advisory Board (MunEDA)

News  |  www.muneda.com | May 13, 2009

Dr. Bernd Lemaitre, worldclass expert in DFM-DFY, joins MunEDA Advisory BoardFrom: MunEDAType: Press Release

http://www.muneda.com/News&id%3D84

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TSMC gives access to manufacturing data through unified DFM architecture

News  |  www.edn.com | Jun 9, 2008

Marking its first steps toward 32-nm semiconductor manufacturing, Hsinchu, Taiwan-based semiconductor foundry Taiwan Semiconductor Manufacturing Co Ltd is launching today its Unified Design For Manufacturing architecture that aims to improve yields, lowers design costs and accelerates

http://www.edn.com/article/CA6568430.html

TSMC Announces Power Trim Service for Advanced Chip Leakage Power Reduction

News  |  www2.electronicproducts.com | Apr 18, 2008

Exclusively-licensed technology from Blaze DFM, Inc enables design-specific leakage power reduction offering

http://www2.electronicproducts.com/TSMC_Announces_Power_Trim_Service_for_Advanced_Chip_Leakage_Power_Reduction-article-news_10_18_apr2008-html.aspx

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Controlling Process-Induced Charging Heightens Productivity

News  |  www.semiconductor.net | Mar 1, 2009

Process-induced charge defects are becoming a yield issue for next-generation devices, prompting the need for enhanced control during wafer processing.

http://www.semiconductor.net/article/200786-Controlling_Process_Induced_Charging_Heightens_Productivity.php

DAC panel revisits DFM debate

News  |  www.eetasia.com | Jul 31, 2009

Panelist revived the debate on design for manufacturing, with one executing calling it a 'band-aid with diminishing returns.'

http://www.eetasia.com/ART_8800580150_480100_NT_93c9b3ad.HTM

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08-APR-2008 to 10-APR-2008: "Is a board 'good' because the test passes?", technical paper on Board Test Coverage Analysis presented at the Aerospace Testing Seminar 2008.

http://www.aster-ingenierie.com/

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Cadence Delivers 28-Nanometer Design Capabilities to TSMC Reference Flow 10.0

News  |  www.nanowerk.com

Cadence Delivers 28-Nanometer Design Capabilities to TSMC Reference Flow 10.0

http://www.nanowerk.com/news/newsid=11817.php