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ordered by relevance and dateThe Coming of EUV Lithography – When?
Audio | www.semiconductor.net | Sep 23, 2009
Senior Editor Alexander E. Braun interviews Toppan Photomasks CTO Franklin Kalk at the SPIE Photomask conference about the status of lithography in general and EUV lithography development in particular. Kalk believes considerable work and development still remain to be done for EUV to become a
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Microwave Engineering Online - Encyclopedia
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Arthur W. Zafiropoulo, Ultratech Inc.
Audio | www.semiconductor.net | Oct 1, 2009
On the occasion of his company's 30th anniversary, Arthur Zafiropoulo, chairman and CEO of Ultratech Inc., talks about his career and focuses on some of today's technology developments in the areas of EUV lithography, metrology, 3-D integration, and the perils of losing more markets to foreign
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Nanoimprint Lithography in Good Position for Flash Push
Audio | www.semiconductor.net | Dec 20, 2007
Mark Melliar-Smith, CEO of Molecular Imprints Inc. (MII, Austin, Texas), explains why he’s more optimistic than ever about nanoimprint lithography and its capabilities, particularly for high-density memory.
EUV Requires Enhanced Metrology
Audio | www.semiconductor.net | Apr 1, 2009
Kurt Ronse, director of the Advanced Lithography Program at IMEC, talks about the work being done on EUV lithography. “As we approach the 22 nm node and look beyond it, it’s becoming increasingly challenging to measure with sufficient accuracy which dimensions have been created and whether they
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Processing Challenges at the 32 nm Edge
Audio | www.semiconductor.net | Jun 1, 2008
Girish Dixit, vice president, worldwide process applications and field process support at Novellus Systems, talks about the challenges introduced by smaller features and new materials, as well as behavior changes of traditional elements when designed into these smaller nodes.
http://www.semiconductor.net/podcast/Movers_Shakers/1891-Processing_Challenges_at_the_32_nm_Edge.php
