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X-Rays Measure Locally Strained Silicon

Michael Hecker, senior materials analyst at AMD Saxony, says that local measurement of the strain state is essential for developing improved device structures.

More Faith Put in EUV, Not High Index

Kurt Ronse, director of lithography at IMEC, explains the setbacks and difficulties facing high-index immersion lithography, while more chipmakers are pushing for EUV development.

AMD's Grose Considers 450 mm Wafers, SOI

Doug Grose, senior vp of manufacturing and supply chain management at AMD, discusses his perspectives on the wafer size debate, bulk silicon vs. SOI, manufacturing productivity, and more.

Advocating More Open Communication on EUV Lithography

Vivek Bakshi, founder and president of EUV Litho Inc., explains why he started up the International Workshop on EUV Lithography, which took place in Maui in June. He also expands on recent developments in EUV, and why more research is needed.

IMEC Expecting Two EUV Source Upgrades

As a follow-up from the EUVL Symposium in Sapporo, Japan, Kurt Ronse, IMEC’s director of lithography, talks about the source upgrades expected on the EUV alpha demo tool at IMEC, plus a variety of other issues surrounding EUV lithography’s development.

Inverse Lithography Gains Further Market Acceptance

Moris Kori, CEO of Luminescent Technologies, discusses the latest sale of a Luminizer RET tool, more about the company's technology, and the direction he is taking the company since taking over as CEO.

High-k Metal Gate Has Scalability, Implementation Issues

Raj Jammy is an IBM assignee working at Sematech as director of the Front End Processes Division. In this interview, he evaluates some of the materials and design hurdles facing the implementation of high-k/metal gate beyond 32 nm.

APC Tech Talk

APC WORLD WIDE World Wide [ Change ] Home Products Support Search the Knowledge Base Ask APC My Support Services Selectors UPS Selector InfraStruXure Estimator Wiring Closet And Server Room Selector UPS Upgrade Selector Surge Protection Selector Rack Configurator

Nanoimprint Lithography in Good Position for Flash Push

Mark Melliar-Smith, CEO of Molecular Imprints Inc. (MII, Austin, Texas), explains why he’s more optimistic than ever about nanoimprint lithography and its capabilities, particularly for high-density memory.

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