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More Faith Put in EUV, Not High Index
Kurt Ronse, director of lithography at IMEC, explains the setbacks and difficulties facing high-index immersion lithography, while more chipmakers are pushing for EUV development.
Advocating More Open Communication on EUV Lithography
Vivek Bakshi, founder and president of EUV Litho Inc., explains why he started up the International Workshop on EUV Lithography, which took place in Maui in June. He also expands on recent developments in EUV, and why more research is needed.
IMEC Expecting Two EUV Source Upgrades
As a follow-up from the EUVL Symposium in Sapporo, Japan, Kurt Ronse, IMEC’s director of lithography, talks about the source upgrades expected on the EUV alpha demo tool at IMEC, plus a variety of other issues surrounding EUV lithography’s development.
Inverse Lithography Gains Further Market Acceptance
Moris Kori, CEO of Luminescent Technologies, discusses the latest sale of a Luminizer RET tool, more about the company's technology, and the direction he is taking the company since taking over as CEO.
APC Tech Talk
APC WORLD WIDE World Wide [ Change ] Home Products Support Search the Knowledge Base Ask APC My Support Services Selectors UPS Selector InfraStruXure Estimator Wiring Closet And Server Room Selector UPS Upgrade Selector Surge Protection Selector Rack Configurator
Nanoimprint Lithography in Good Position for Flash Push
Mark Melliar-Smith, CEO of Molecular Imprints Inc. (MII, Austin, Texas), explains why he’s more optimistic than ever about nanoimprint lithography and its capabilities, particularly for high-density memory.
Arthur W. Zafiropoulo, Ultratech Inc.
On the occasion of his company's 30th anniversary, Arthur Zafiropoulo, chairman and CEO of Ultratech Inc., talks about his career and focuses on some of today's technology developments in the areas of EUV lithography, metrology, 3-D integration, and the perils of losing more markets to foreign
Timothy Groves, CNSE, University at Albany
Timothy Groves, director of the Center for Nanolithography Development at the College of Nanoscale Science and Engineering at the University at Albany, talks about the future of lithography, including the status of, and problems with, extreme ultraviolet (EUV) technology, as well as about what the
EUV Requires Enhanced Metrology
Kurt Ronse, director of the Advanced Lithography Program at IMEC, talks about the work being done on EUV lithography. “As we approach the 22 nm node and look beyond it, it’s becoming increasingly challenging to measure with sufficient accuracy which dimensions have been created and whether they
