Events
X-FAB Semiconductor Foundries AG | DATE - Design, Automation and Test in Europe
The Design, Automation, and Test in Europe (DATE) conference is the worlds premier conferences dedicated to electronic and embedded systems.
CVD Equipment Corporation | 2010 Tradeshow Schedule
CVD Equipment's 2010 Tradeshow Schedule - Nanotech, Semicon West, Tools for Technology Expo, Intersolar, MRS SFall and more!
CVD Equipment Corporation | 2010 Tradeshow Schedule
CVD Equipment's 2010 Tradeshow Schedule - Nanotech, Semicon West, Tools for Technology Expo, Intersolar, MRS Fall and more!
CVD Equipment Corporation | 2008 Tradeshow Schedule
CVD Equipment Corporation 2008 Tradeshow Schedule, Exhibiting and Attending
Microsoft Word - UBooth_2010_description_final.doc
Model Based Analysis of Industrial Equipment Authors: André GELLRICH, Volodymyr VASYUTYNSKYY, Klaus KABITZSCH Affiliation: Dresden University of Technology, Germany Presenter: André Gellrich E-Mail: andre.gellrich@tu-dresden.de 1. Motivation Analysis of internal logistic processes in
CVD Equipment Corporation | 2009 Tradeshow Schedule
CVD Equipment's 2009 Tradeshow Schedule - Intersolar North America, MRS Fall Meeting and More!
Design Guidelines for Metallic-Carbon-Nanotube- Tolerant Digital Logic Circuits
Design Guidelines for Metallic-Carbon-Nanotube-Tolerant Digital Logic Circuits Jie Zhang, Nishant P. Patil, Subhasish Mitra Stanford University, Stanford, CA Abstract Metallic Carbon Nanotubes (CNTs) create source-drain shorts in Carbon Nanotube Field Effect Transistors (CNFETs), causing
A Resilience Roadmap
A Resilience Roadmap (Invited Paper) Sani R. Nassif Austin Research Laboratory IBM Corporation Austin, TX 78758 nassif@us.ibm.com Nikil Mehta Department of Computer Science California Institute of Technology Pasadena, CA 91125 nikil@caltech.edu Yu Cao Department of Electrical Engineering Arizona
A Methodology for The Characterization of Process Variation in NoC Links
A Methodology for the Characterization of Process Variation in NoC Links Carles Hern´ andez, Federico Silla, and Jos´ e Duato Universidad Polit´ ecnica de Valencia, Grupo de Architecturas Paralelas, Departamento de Inform´ atica de Sistemas Camino de Vera s/n 46022 Valencia, Espa˜ na Email:
On Modeling and Testing of Lithography Related Open Faults In Nano-CMOS Circuits
Light Source Wavelength Minimum feature size 90 ‘80 ‘82 ‘84 ‘86 ‘88 ‘90 ‘92 ‘94 ‘96 ‘98 ‘00 ‘02 ‘04 0.01 0.10 1.0 10.0 G-line λ= 436 I-line λ= 365 KrF λ= 248 ArF λ= 193 2000 1500 1000 600 400 350 250 180150 130 Year Feature size (nm) ‘12 ‘16 ‘20 65 45 32 EUV λ= 13 On Modeling and Testing of
