Lithography News

News

Cymer reports major progress on EUV power source
cdn.eetimes.com | 4 hours 4 minutes ago
Cymer was set to reveal significant improvements in EUV source power, availability and dose control. < br/ > < br/ > View the full article < a href="http://www.eetimes.com/electronics-news/4236411/Cymer-reports-major-progress-on-EUV-power-source-" > HERE < /a > .

TEL joins DSA, maskless litho projects
www.eetasia.com | 14 hours 41 minutes ago
Japan's Tokyo Electron Ltd (TEL) is working with on two collaborative lithography research projects spearheaded by the CEA-Leti research institute.

Cymer reports major progress on EUV power source
www.edn.com | Feb 16, 2012
Cymer Inc is expected to reveal that it has made significant progress in the development of a power source for EUV (extreme ultraviolet) lithography over the past few months.

E-beam production comes out of the shadows
www.electronicsweekly.com | Feb 16, 2012
Lithography gloom lifted a little as electron beam production lithography demonstrated 22nm dense lines and spaces and 22nm dense contact holes using positive chemically-amplified resist. "This demonstrated..

ASML Brion Introduces Solution for Faster, More Cost-Effective Mask Data Preparation for
www.nanowerk.com | Feb 13, 2012
ASML Brion Introduces Solution for Faster, More Cost-Effective Mask Data Preparation for Leading-Edge Chip Designs

Imec Announces World-First 300mm-Fab Compatible Directed Self-Assembly Process Line - Printed
www.printedelectronicsnow.com | Feb 10, 2012
Can DSA become the next patterning solution extending the limits of 193nm and EUV lithography

300mm DSA Imec 300mm fab compatible directed self assembly process line : Electronics News from
www.electronicspecifier.com | Feb 10, 2012
Imec announces world-first 300mm-fab compatible directed self-assembly process line : Electronics News from Electronic Specifier

Embedded Solutions Day - Thursday 22nd March 2012 | PRLog
www.prlog.org | Feb 6, 2012
Embedded Solutions Day - Thursday 22nd March 2012. An essential one-day workshop for engineers considering a new design containing either an embedded PC or RISC processor. - PR11791151

EUV Frequency Comb Debuts (photonics.com | Feb 2012 | Research & Technology)
www.photonics.com | Feb 6, 2012
The first “frequency comb” in the extreme ultraviolet band has the potential to advance nuclear cloc...

Researchers develop a frequency comb that can untangle the extreme ultraviolet spectrum
arstechnica.com | Feb 2, 2012
A frequency comb takes a single, intense burst of laser light and splits it into an evenly spaced set of wavelengths. Researchers have now built a frequency comb that operates in the extreme ultraviolet, which may us help develop the next generation of nuclear clocks.