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Mentor Graphics Supports Design for Six Sigma Methodologies
News | auto.sensorsmag.com | 14 hours 51 minutes ago
The company's virtual prototyping tool SystemVision applies Six Sigma principles in model-driven development, delivering improvements in both productivity and quality.
MHS Electronics Announces Tanner EDA Foundry Design Kits
News | edageek.com | Jul 16, 2008
MHS Electronics (Nantes, France) has announced that it is now supporting Tanner's EDA tools with foundry design kits for analogue ...
edXact Joins Synopsys in-Sync Interoperability Program
Press Release | www.edn.com | Jul 16, 2008
GRENOBLE, France, July 16, 2008 – Backend verification specialist edXact SA today announced that it has joined Synopsys’ in-Sync® interoperability program.
Xbox 360 Recall: Penny Wise, Pound Stupid
Blog | www.electronicsweekly.com | Jul 15, 2008
EETimes reports the real reason behind the disastrous, $1B-dollar Xbox 360 recall last year. Unfortunately, it's all an all too familiar tune these days with unrelenting pressure on design engineers to cut costs and speed design cycle. Writes editor Junko Yoshido...
tools_news_071408_3
Press Release | www.cree.com | Jul 14, 2008
Cree Inc. is a market-leading innovator and manufacturer of semiconductors that enhance the value of solid-state lighting, power and communications products by significantly increasing their energy performance.
Envis Corporation Joins Si2's Low-Power Coalition
News | www10.EDACafe.com | Jul 11, 2008
AUSTIN, Texas(BUSINESS WIRE)July 10, 2008.bwtextaligncenter {text-align: center} Silicon Integration Initiative (Si2
http://www10.EDACafe.com/nbc/articles/view_article.php?articleid=556441
KLA-Tencor Launches First Computational Lithography Tool To Address Double-Patterning Challenges (Business Wire)
News | biz.yahoo.com | Jul 10, 2008
KLA-Tencor Launches First Computational Lithography Tool To Address Double-Patterning Challenges. - SAN JOSE, Calif.--(BUSINESS WIRE)--Today KLA-Tencor (NASDAQ:KLAC - News) introduced the latest version of its industry-leading computational lithography tool, PROLITH™ 11.
Envis Corporation Joins Si2's Low-Power Coalition - Zibb.com
Press Release | www.zibb.com | Jul 10, 2008
Silicon Integration Initiative (Si2) today announced that Envis Corporation has joined Si2's Low Power Coalition (LPC), an open industry group focused on advancing low-power design flow capability through open standards. The LPC owns and maintains the Common Power Format (CPF), an Si2 standard. The
http://www.zibb.com/article/3574580/Envis+Corporation+Joins+Si+s+Low+Power+Coalition
ESL handoff--closer than you think
News | www.automotivedesignline.com | Jul 8, 2008
Any viable design methodology requires tight links to implementation, and to meet this need a new generation of High-Level Synthesis tools is emerging, based on SystemC.
http://www.automotivedesignline.com/208806025?cid=RSSfeed_automotivedesignline_adlRSS
tools_app_070708
News | www.sonicsinc.com | Jul 7, 2008
Sonics analyzes how multi-threaded non-blocking data transfers can ease the design of multiple general- and special-purpose heterogeneous processing blocks with different speeds and feeds.
http://www.sonicsinc.com/download_doc.php?doc=GSPxPaper_Easing_TV_SoCs.pdf
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