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North American Engineering Student FPGA Competition Sign-Ups Open
News | www.altera.com | 3 hours 11 minutes ago
Ottawa, Canada, October 5, 2009—Altera Corporation (NASDAQ: ALTR), Terasic Incorporated, Impulse Accelerated Technologies Inc. and the Institute of Electrical and Electronics Engineers (IEEE) Canada today announced that sign-ups are open for the 2009 Innovate North America FPGA Competition.
http://www.altera.com/corporate/news_room/releases/2009/products/nr-innovate_na.html?f=hp&k=wn1
PHOTONICS : SensL launch the first large area fully integrated imager based on Silicon Photomultiplier technology
News | www.i-micronews.com | 6 hours 30 minutes ago
The low light detector solutions provider, SensL, announces the launch of the SPMMatrix, the world's first Silicon Photomultiplier based imaging system for applications such as nuclear medicine, homeland security and high energy physics.
Rochester Electronics expands space-level manufacturing, radiation-hardened semiconductor offerings
News | MAE.pennnet.com | Nov 21, 2009
Military & Aerospace Electronics - Rochester Electronics expands space-level manufacturing, radiation-hardened semiconductor offerings - NEWBURYPORT, Mass., 21 Nov. 2009. Rochester Electronics, a source for discontinued semiconductors, is actively expanding its mission-critical product
Design/GUI-Software-Speeds-PCB-Assembly-Design-Verification
Press Release | www.electronicspecifier.com | Nov 21, 2009
GUI Software Speeds PCB Assembly Design Verification : Electronics News from Electronic Specifier
http://www.electronicspecifier.com/Design/GUI-Software-Speeds-PCB-Assembly-Design-Verification.asp
Conquering the Univers(al)
Blog | circuitsassembly.com | Nov 20, 2009
USI is, of course, the world’s 24th largest – and Taiwan’s third largest, after Foxconn and Orient Semiconductor – provider of EMS services. It had 2008 EMS sales of $490.4 million, and EMS work makes up about 25% (or about $318 million) of its overall sales so far this year.
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Details of Intel's 32nm Atom emerge, on track for 2011
News | www.techspot.com | Nov 20, 2009
According to Fudzilla, some new information has emerged about Intel's 2011 Atom platform, which will be a successor to the imminent Pine Trail platform. Codenamed Cedar Trail, the 2011 refresh should bring the first Atom processors built with a 32nm fabrication. Behind the scenes, Fudzilla says
http://www.techspot.com/news/37049-details-of-intels-32nm-atom-emerge-on-track-for-2011.html
DDR3 memory transistion next year
Blog | embeddedblog.blogspot.com | Nov 20, 2009
Shipments of high speed, low power DDDR3 memmory will rise to account for more than half of the global DRAM market by the second quarter of 2010, surpassing DDR2 for the first time as the leading technology for PC main memory, says market researcher iSuppli. DDR3’s share of the DRAM market in terms
http://embeddedblog.blogspot.com/2009/11/ddr3-memory-transistion-next-year.html
Applied-Semitool deal: What analysts are saying
News | www.eetimes.com | Nov 20, 2009
As reported, Applied Materials Inc. and Semitool Inc. this week announced a definitive agreement for Applied to acquire the outstanding shares of Semitool for $11 per share in an all-cash tender offer.
http://www.eetimes.com/rss/showArticle.jhtml?articleID=221900486&cid=RSSfeed_eetimes_newsRSS
Saelig Launches Software; Speeds PCB Assembly Design Verification
Press Release | www.pcb007.com | Nov 20, 2009
Saelig Company, Inc. announces the availability of GTO, an easy-to-use Graphical User Interface (GUI) tool, expressly designed to help rework technicians, assembly technicians and PCB assembly contract manufacturers to easily locate single or multiple components on a PCB.
Toshiba develops molecular photoresist technology for EUV lithography
News | nanotechwire.com | Nov 20, 2009
Toshiba Corporation today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world's first 20nm-scale generation process
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