Chip Production Industry News & Blogs

Industry News & Blogs

Initiative updates e-beam roadmap
www.eetasia.com | 1 hour 55 minutes ago
Electron-beam technologies such as mask process correction and others are being guided by initiative members to facilitate a working ecosystem.

TEL joins CEA-Leti programs on DSA, maskless litho
cdn.eetimes.com | 9 hours 44 minutes ago
TEL joins CEA-Leti programs on DSA, maskless litho

Energy Conversion Devices and subsidiaries file for bankruptcy | PV-Tech
www.pv-tech.org | 10 hours 10 minutes ago
Few should be surprised that Energy Conversion Devices (ECD) and wholly owned subsidiary, United Solar Ovonic (USO) have entered Chapter 11 proceedings in the US Bankruptcy Court for the Eastern District of Michigan.

Cirrus Logic Energy Measurement ICs Offer Lowest Cost Solution While Optimizing Performance for
www.cirrus.com | Feb 13, 2012
Cirrus Logic unveils family of AFE ICs for single/polyphase energy meters for smart grid.

Maskless e-beam litho good for 14-nm , says CEA-Leti
www.edn.com | Feb 13, 2012
French research institute CEA-Leti has said that 22-nm lines and spaces have been created using direct-write e-beam lithography technology and that the demonstrated resolution meets the requirements for both 14- and 10-nm logic processing nodes.

Materials Today - Implementing educational change: heeding the messages from materials science
www.materialstoday.com | Feb 13, 2012
Change is the order of the day. However, this state of flux is not confined to materials scientists. Organisations such as the UK Centre for Materials Education (UKCME), charged with a remit to enhance student learning, are also in the business of change.

ASML Brion Introduces Solution for Faster, More Cost-Effective Mask Data Preparation for
www.nanowerk.com | Feb 13, 2012
ASML Brion Introduces Solution for Faster, More Cost-Effective Mask Data Preparation for Leading-Edge Chip Designs

Imec Announces World-First 300mm-Fab Compatible Directed Self-Assembly Process Line - Printed
www.printedelectronicsnow.com | Feb 10, 2012
Can DSA become the next patterning solution extending the limits of 193nm and EUV lithography

Power Measurement SoC monitors 3-phase POL applications., Maxim Integrated Products
news.thomasnet.com | Feb 10, 2012
New SoC Enables Measurement and Diagnostics for High-Power Monitoring in Industrial Applications and Data Centers, Maxim Integrated Products

300mm DSA Imec 300mm fab compatible directed self assembly process line : Electronics News from
www.electronicspecifier.com | Feb 10, 2012
Imec announces world-first 300mm-fab compatible directed self-assembly process line : Electronics News from Electronic Specifier