Lithography Industry News & Blogs

Industry News & Blogs

ASML Brion Introduces Solution for Faster, More Cost-Effective Mask Data Preparation for
www.nanowerk.com | 2 hours 50 minutes ago
ASML Brion Introduces Solution for Faster, More Cost-Effective Mask Data Preparation for Leading-Edge Chip Designs

300mm DSA Imec 300mm fab compatible directed self assembly process line : Electronics News from
www.electronicspecifier.com | Feb 10, 2012
Imec announces world-first 300mm-fab compatible directed self-assembly process line : Electronics News from Electronic Specifier

Successful Adoption of DFM
cdn.eetimes.com | Feb 6, 2012
Two factors are influencing the use of DFM for IC development at 28 nm and below. First, foundries now require or strongly recommend DFM checks for advanced nodes... < br/ > < br/ > View the full article < a href="http://www.eetimes.com/design/eda-design/4235844/Successful-Adoption-of-DFM" > HERE <

Embedded Solutions Day - Thursday 22nd March 2012 | PRLog
www.prlog.org | Feb 6, 2012
Embedded Solutions Day - Thursday 22nd March 2012. An essential one-day workshop for engineers considering a new design containing either an embedded PC or RISC processor. - PR11791151

EUV Frequency Comb Debuts (photonics.com | Feb 2012 | Research & Technology)
www.photonics.com | Feb 6, 2012
The first “frequency comb” in the extreme ultraviolet band has the potential to advance nuclear cloc...

Researchers develop a frequency comb that can untangle the extreme ultraviolet spectrum
arstechnica.com | Feb 2, 2012
A frequency comb takes a single, intense burst of laser light and splits it into an evenly spaced set of wavelengths. Researchers have now built a frequency comb that operates in the extreme ultraviolet, which may us help develop the next generation of nuclear clocks.

LEDs Magazine - Brussels Airport boarding bridges will be fitted with PAS-NGL LED tubes
www.ledsmagazine.com | Jan 31, 2012
LEDs MAGAZINE OUTDOOR LIGHTING INDOOR LIGHTING LOGIN | SUBSCRIBE LEDs Magazine HOME ARTICLES NEWS PRODUCTS BUYERS GUIDE EVENTS ADVERTISE CONTACT US MAGAZINE NEWSLETTERS JOBS TOPIC CENTER RESOURCE CENTER Whole Site News Articles Products Products Case Studies Press Releases Add Announcement Promote

I-Micronews - MEMS : Heidelberg instruments introduces lithography solution ...
www.i-micronews.com | Jan 27, 2012
An advanced table top direct write lithography system.

FUJIFILM Joins SEMATECH’s Resist Center for Advanced EUV Resist Development at UAlbany NanoCollege,
nanotechwire.com | Jan 26, 2012
SEMATECH, a global consortium of chipmakers, announced today that FUJIFILM Electronic Materials, a leading global supplier of photoresists, developers, cleaners and removers, polyimides and thin film chemicals and equipment for the semiconductor industry, has joined SEMATECH’s Resist Materials and

CompoundSemi Online - The Original Compound Semiconductor Industry Newspaper
www.compoundsemi.com | Jan 26, 2012
Alpha and Omega Semiconductor Limited of Sunnyvale, California USA, a developer and global supplier of power semiconductors, and SemiSouth Laboratories jointly demonstrated UniSiC™, a 1200V, 90mohms MOSFET in a TO262 package. The MOSFET is designed to meet the growing need ... < br > < br >