Lithography Products

Products

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Lithography Lens Assembly
semiconductor.net | Mar 15, 2004
The Tropel AquaCAT immersion micro-objective is a lens assembly that enables semiconductor manufacturers to further reduce line widths and extend the capabilities of 193 nm chip fabrication technologies. The product design is based on the manufacturer's catadioptric micro-objective, but applies

APC Tool
semiconductor.net | Sep 15, 2004
TOOLweb suite of products enables real-time, secure access to the tool, sensor and instrument data required by new and legacy APC and e-diagnostic solutions. TOOLweb uses an open architecture with the flexibility to access the data needed by each application and to add new data sources as necessary.

Lithography Optimization Tool
semiconductor.net | Mar 15, 2005
Prolith v8.1, an optimization tool designed to help users understand more clearly the lithographic effects of extreme resolution enhancement techniques (RETs), uses a multi-algorithm 3-D EMF simulation architecture. This mask topography option provides highly accurate simulations, cutting

Lithography Optimization Tool
semiconductor.net | Dec 1, 2004
Prolith v8.1, an optimization tool designed to help users understand more clearly the lithographic effects of extreme resolution enhancement techniques (RETs), uses a multi-algorithm 3-D EMF simulation architecture.

Lithography Software Tool
semiconductor.net | Mar 15, 2007
Layout BEAMER 2.0 is a high-performance data preparation solution that has layout processing with proximity effect correction and the VisualFLOW platform in one package. It closes the full layout processing chain from the design data in all major formats to writing on the major e-beam machines by

Photoresist Filter
semiconductor.net | Nov 2, 2000
Polyfix all polyolefin hollow fiber filter is designed to remove 0.05, 0.02 or 0.1 micron impurities from photoresist. The filters are available with 18,000 or 36,000 square centimeter filtration areas. They offer high retention rate for gelled particl

Photoresist Strippers
semiconductor.net | Mar 15, 2006
BAKER ALEG-370, 625 and PRS 3000 are photoresist strippers that meet the cleaning challenges of wafer bump technologies. Version 625 is effective at cleaning gold bumps (all versions clean lead and copper bumps), indium lead bumps and lead tin bumps. Models 370 and PRS-3000 are high-performance

Photo-Acid Generators
semiconductor.net | Jul 16, 2001
This family of non-perfluorooctane sulfonate (PFOS) photo-acid generators (PAGs) is for use in 193 nm and advanced 248 nm semiconductor photoresist. A variety of the company's perfluoro imide- and perfluoro methide-based PAGs are available to semiconduc

Reticle Defect Review Software
semiconductor.net | May 1, 2000
The Reticle Defect Review Interface is designed for the Leica's LWM250 series of reticle CD metrology systems to review defects on photomasks/reticles that were detected using Lasertec's 9MD series of automatic photomask/reticle inspection systems. A soft