Whitepapers
Microsoft Word - VOIP FINAL.doc
Friend or Foe? The VoIP Opportunity for Telcos 2 Executive Summary While there has been much debate on convergence and the question of who might be best positioned to deliver integrated voice, data, and video solutions to the end user, there is little debate that Voice over Internet Protocol
TechOnline | Extreme vs. Traditional OPC for the 22nm Node
The 22nm node will be patterned with very challenging Resolution Enhancement Techniques (RETs) such as double exposure or double patterning. Even with those extreme RETs, the k1 factor is expected to be roughly 0.29.
Microsoft Word - RTPvsTS-v4.doc
Powering MPEG-4 Applications from Mobile to HD WHITEPAPER – IP Streaming of MPEG-4: Native RTP vs MPEG-2 Transport Stream Authors: Alex MacAulay, Boris Felts, Yuval Fisher October 2005 IP Streaming of MPEG-4: Native RTP versus MPEG-2 Transport Stream Copyright © 2005, Envivio, Inc. Page 2 of 12
Managing SIP traffic with ZXTM
Managing SIP traffic with ZXTM Zeus Technology Limited (UK) Sales: +44 (0)1223 568555 Zeus Technology, Inc. (U.S.) Phone: 1-888-ZEUS-INC The Jeffreys Building Main: +44 (0)1223 525000 Suite 320 - 5201 Great America Parkway Fax: (866) 628-7884 Cowley Road Fax: +44 (0)1223 525100 Santa Clara
TechOnline | Chip Design Using 45nm Processes Requires a Holistic Approach to Planning and
Designing chips in 45nm processes requires more planning, extra analysis, and complex trade-offs to reduce die area while maintaining or gaining performance, yield, and reliability. Many of the challenges chip designers face are issues of either manufacturability or scale and complexity. These
TechOnline | Intensive 2D SEM model calibration for 45nm and beyond
This paper documents the issues of the site-base model calibration technique at the 45nm technology node and beyond. It also demonstrates the improvement in model accuracy for critical gate regions o
TechOnline | Intel 45nm Penryn Processor (QX9650) Overview
This Insight Report analyzes Intel's 45nm Penryn processor in detail. The device is an engineering milestone, with a small process lithography and high K gate dielectrics. Intel claims this can deliver more than a 20 percent increase in transistor switching speed, and reduce transistor gate leakage
TechOnline | Matsushita 45nm UniPhier (MN2WS0038AP) Overview
This Insight report analyzes the Matsushita 45nm UniPhier which is used in the Panasonic DMR-XW200V Blu-Ray DVD Player, available in Japan — the first true 45nm device of any kind available on the market. Semiconductor Insights claims that this moves Matsushita ahead of all others in terms of
TechOnline | Variability Aware Modeling and Characterization in Standard Cell in 45 nm CMOS with
Gate density is ultimately increased to 2100 kGates/mm2 by pushing the critical design rules without increasing the circuit margin in 45 nm technology. Layout dependencies for stress enhanced MOSFET including contact positioning, 2nd neighboring poly effect, and bent diffusion are accurately
TechOnline | 22 nm Technology Node Active Layer Patterning for Planar Transistor Devices
In this paper, we demonstrate the patterning of active layer for 22 nm planar transistor device and discuss achievements and challenges in 22 nm lithographic printing.
